Wafer analytics
© Fraunhofer CSP
Wafer analytics

Material Analytics

We offer classic and innovative chemical analysis for customers from a wide range of industries. The core areas of our R&D services are ultratrace analysis in high-purity materials, chemical characterization of surfaces and interfaces, thermo-mechanical and chemical analysis of polymer materials. In the area of special analytics we investigate gas permeation e.g. through barrier films and membranes as well as the effusion of gases from thin layers. For this purpose, we mainly use methods and measuring instruments we have developed ourselves. Thus, a large number of gases and gas mixtures can be analyzed, even simultaneously.

Companies with a need for high-purity materials, e.g. from the semiconductor industry, photovoltaics, laser optics, laminated glass production and many more, benefit from our support. Depending on customer requirements, we offer simple analytical services as well as root cause analyses and complex problem solutions.

Our expertise includes:

  • Trace analysis in volume and on surfaces
  • Characterization and evaluation of polymer materials
  • Effusion and permeation measurements

 

Polymer Analytics and Polymer Assessment

Thermo-mechanical behavior, chemical analysis, ageing, resistance and barrier properties of films and membranes.

 

Ultratrace Analysis

Depending on the customer's requirements, we offer analytical services as well as root cause investigations and complex problem solutions.

 

Element Analysis for Process Control

Laser Induced Breakdown Spectroscopy (LIBS) enables in-line analysis of element contents, whether for controlling coating processes, optimizing recycling or for real-time material control on the conveyor belt.

 

High Purity Oligosilanes

We support the development of innovative precursors for various separation processes with powerful trace analysis and corresponding method development.

 

Clean Wafers

Inorganic and organic impurities on wafer surfaces affect the subsequent process steps as well as the final device function. We support reliable process monitoring.

 

Effusion Measurements

While the sample is heated at a constant temperature ramp, the effusion of different gases can be determined quantitatively. This allows e.g. the investigation of material properties in high-temperature processes

Microwave digestion
© Fraunhofer CSP
Microwave digestion

For our customers we offer a wide range of state-of-the-art equipment for the chemical and thermo-mechanical characterization of various materials, as well as the necessary human resources for the reliable operation of our equipment park. Justification of our customers' trust is our greatest asset. Under this maxim committed employees dedicate themselves to your questions. The following equipment is used:

  • High-resolution sector field ICP mass spectrometer (Element XR)
  • Triple-Quadrupol-ICP-Mass spekctrometer (QQQ-ICP-MS)
  • ICP Optical Emission Spectrometer (iCAP 6500)
  • Laser ablation (Cetac LSX213)
  • Microwave digestion system (Multiwave 3000)
  • Evaporation units Clean Acid and Evapoclean
  • TOC analyzer (multi NC UV/HS)
  • Particle size measuring device (CILAS 930)
  • Karl Fischer titrator (Compact Volumeter V20)
  • Contact angle measuring device (Dataphysics OCA20)
  • Multi-element analysis instrument FiberLIBS Lab
  • Effusion measuring station (self-made)
  • DMA (Netzsch DMA 242 C)
  • TMA (Shimadzu TMA-60)
  • DSC (Netzsch DSC 204 F1 Phoenix)
  • Rotary rheometer (Thermo Haake MARS I)
  • TGA with IR coupling (Netzsch TGA 209 F1 Iris)
  • Mechanical testing (INSTRON 5848 MicroTester; MTS Landmark 370.02; ZWICK Z050 and Z400)
  • Gas permeation measuring stand with MS coupling (Pfeiffer Thermostar)
  • WVTR determination (MOCON Permatran W 3/33 MG Plus)
  • Soxhlet extraction (gel content)
  • FTIR (Bruker Vertex)
  • Sample conditioning by means of climatic test chamber
  • Thermo Desorption Gas Chromatography Mass Spectrometry TD-GC-MS (Markes unity-xr/GC Trace 1300/MS ISQ 7000 series)