Ultratrace Analysis

ICP-MS Trace Analysis – Reliable Results for Maximum Material Purity

ICP-MS
© Fraunhofer CSP
The ICP-MS is loaded with samples.

When the highest purity is essential, ICP-MS analysis delivers precise data down to the ppt range. This method enables the reliable detection of even the smallest amounts of inorganic impurities – especially metals. We support you in quality assurance, process control, and research.

What we offer:

  • ICP-MS analysis of a wide range of materials such as silicon, silanes (HCDS, STC, TCS…), quartz glass, silicon carbide (SiC), fuel cells (CCMs), and more
  • Detection of metallic impurities and trace elements on surfaces and inside your samples (bulk analysis)
  • Detection limits down to the low ppt range – for maximum sensitivity and accuracy

Your benefit:

With our precise trace analysis, you ensure the quality of your products, detect impurities at an early stage, and optimize your processes.
This helps you protect your brand, improve product quality, and minimize risks.

Our research facility is certified according to DIN ISO 9001.

Watch the video below to get an impression of our analytical services. Contact us for a personalized consultation – we’ll help you achieve your quality goals!

Topics

Silicon Analysis

High-Purity Quartz Glass

Analysis of Silanes (HCDS, TCS, STC…)

Silicon Carbide

Fuel Cells

High Purity Acids

Aqueous Solutions

Chemical Material Resistance

Consulting and Training Trace Analysis

Trace Analysis for the Detection of Impurities in Silicon

Wafer Surface Purity
© Fraunhofer CSP
Determination of surface purity on silicon wafers
Experimental CZ silicon crystal
© Fraunhofer CSP
Experimental CZ silicon crystal and vertical concentration profile of impurities (example: aluminum).
Float Zone Crystals
© Fraunhofer CSP
Float Zone Crystals

Bulk Analysis / Volume Analysis

  • Chemical digestion with acids: Silicon is dissolved using acids such as hydrofluoric acid. Subsequent analysis, including the detection of metallic impurities, is performed using ICP-MS (Inductively Coupled Plasma Mass Spectrometry).
  • Wide range of sample types: Analyzable samples include, for example, feedstock, crystals, wafers, powders, and recycled materials.
  • Sample material requirements: Ideally, a sample quantity of at least 5 g is required.
  • Detection limits: Detection limits vary depending on the sample and element, ranging from a few ppb (parts per billion, µg/g) down to the ppt range (parts per trillion, ng/g).
  • Layer-specific etching: Layer-specific etching followed by ICP-MS analysis allows for the localization of impurities, enabling the use of efficient cleaning methods for your materials.

 

Surface Analysis

  • Determination of surface contamination: ICP-MS analysis is used to determine impurities on surfaces, in particular (but not limited to) silicon wafers.
  • Customized etching solutions: The etching solution is tailored to meet specific requirements (e.g., only the surface, including oxide layer, or thick oxide layers).
  • Flexibility in wafer sizes: All wafer sizes are suitable for analysis.
  • High detection limits: Detection limits depend on the element and can be as low as 1E7 atoms/cm².

Localization of inorganic impurities in silicon samples by sequential etching and ICP-MS detection, 6th International Conference on Silicon Photovoltaics, SiliconPV 2016 [ PDF  0,35 MB]

 

 

to top

ICP-MS Analysis for High-Purity Fused Silica

Trace Element Analysis for Your High-Purity Quartz Glass – Precise Contamination Detection

Do you want to accurately determine the purity of your quartz glass? Whether it's in pieces, powder form, synthetic, or raw material – we support you in identifying and quantifying contamination and impurities in your quartz glass through our specialized trace analysis.

Customized ICP-MS Analysis – High-Resolution Material Characterization

Using our advanced ICP-MS technology, we perform volume, surface, and location-specific analyses of your high-purity material. By sampling different areas, such as cross-sections of your sample, we can identify impurities in specific regions. Targeted etching with hydrofluoric acid allows us to detect impurities at certain depths that are critical to material quality.

Ultra-Low Detection Limits in the ppt Range

Our detection limits reach the ppt level (ng/g), and we require only about 5 g of sample material for analysis. Rely on our expertise to ensure the purity of your materials.

 

to top

Trace Analysis in Silanes (HCDS, TCS, STC…)

hexachlorodisilane
© Fraunhofer CSP
Hexachlorodisilane (HCDS) is used as a precursor material for the production of very thin films and therefore requires a very high purity, which can be determined by ICP-MS.
  • Detection of trace impurities in silanes: We offer comprehensive analysis of impurities in silanes such as hexachlorodisilane (HCDS), pentachlorodisilane (PCDS), silicon tetrachloride (STC), and trichlorosilane (TCS) using ICP-MS (Inductively Coupled Plasma Mass Spectrometry).
  • Versatile testing capabilities: Our services include the analysis of both high-purity substances and raw materials to ensure the highest quality standards.
  • Sample requirements: For precise analysis, we ideally require a sample quantity of 10 g.
  • Excellent detection limits: Our detection limits are element-dependent and range from 5 ppt to 1 ppb, ensuring maximum sensitivity and accuracy.

As part of the  »SilaTrace« we collaborated with PSC Polysilane Chemistry GmbH to develop high-purity pentachlorodisilane (PCDS) as an attractive product for the microelectronics industry. At Fraunhofer CSP, the focus was on optimizing trace analysis to ensure product quality. This initiative was funded by the European Regional Development Fund (ERDF).

Learn more

Project Silapure

More information on our partner PSC GmbH

to top

Surface Analysis on Semiconductor Materials, e.g. Silicon Carbide (SiC)

Characterization of wafer surfaces
© Fraunhofer CSP
By using different acids in the etching process, the layers of materials can be analyzed separately.

Detect Metallic Impurities in Your Materials

  • Surface contamination analysis: Do you know which metallic impurities are present in your materials, such as silicon carbide (SiC)? Whether wafers, coarse powders, or chunks – we support you in precisely identifying surface (not only metallic) impurities.
  • Costumized trace analysis methods: By using various acid mixtures, including hydrofluoric acid, we can effectively remove metallic contaminants. We then analyze the impurities using state-of-the-art ICP-MS technology to provide detailed insights and help you optimize your production processes.
  • Low detection limits: For our ICP-MS analyses, we require a sample quantity starting from 5 g, depending on your specific inquiry. Detection limits vary by element and analytical objective and can reach the ppt range.

to top

Fuel Cells (CCM)

  • Understand the elemental distribution in your Catalyst Coated Membrane (CCM): Do you have questions about the elemental distribution in your proton exchange membrane (PEM) that has been in operation, or in a new Catalyst Coated Membrane (CCM)? Our precise trace analysis offers location-specific sampling and subsequent ICP-MS analysis to effectively detect impurities.
  • Effective sample preparation for optimal results: By selectively extracting small areas from the CCM, we can analyze the elemental content using ICP-MS. This allows us to localize elements and provide insights that help you to better understand and optimize your processes.

 

to top

ICP-MS Analysis of High-Purity Acids

High purity acids
© Fraunhofer CSP
High-purity acids are required for many applications. The trace element contents contained - often in the ppt range - can be detected by ICP-MS.
  • Precise trace element analysis: We offer ICP-MS analysis to detect contamination in your acids, such as high-purity hydrofluoric acid (HF), nitric acid (HNO₃), hydrochloric acid (HCl), and others.
  • Effective sample preparation: Dilution or evaporation is required as part of the sample preparation to achieve optimal results.
  • Minimum sample volume: A minimum of 5 mL of sample is required to perform the analysis reliably.
  • Excellent detection limits: Our detection limits are element-dependent and reach the ppt range (parts per trillion, ng/L).

 

 

to top

ICP-MS Analysis of Ultrapure Water and Aqueous Solutions, e.g., for the Semiconductor Industry

Purity of aqueous solutions
© Fraunhofer CSP
The very high purity of aqueous solutions required for many processes can be checked using ICP-MS analysis.
  • Precise ultra-trace analysis: We perform the analysis of inorganic impurities in aqueous solutions, ultrapure water (UPW), and process water using ICP-MS (Inductively Coupled Plasma Mass Spectrometry).
  • Minimum sample volume: A minimum of 5 mL is required for reliable analysis.
  • Excellent detection limits: Our detection limits are in the low ppt range (parts per trillion) and are element-dependent, ensuring high measurement accuracy.

 

 

to top

Material Resistance to Acids

© Fraunhofer CSP
PVDF screws in comparison: After exposure to acid vapor, the sample shows significant discoloration due to chemical interaction.
  • Comprehensive material analysis: We examine various materials, such as silicon carbide (SiC), as well as polymers and sealing materials, for their behavior under acid exposure.
  • Variability in acids and conditions: We vary the types of acids, acid concentrations, and temperatures to analyze their effects on the materials.
  • Leaching analysis: By determining the elemental content leached from the material using ICP-MS (Inductively Coupled Plasma Mass Spectrometry), we can assess how impurities are dissolved from the surface into deeper layers depending on the acid used.
  • Sample geometries and microscopic changes: We determine sample geometries and microscopic changes before and after exposure tests to evaluate material integrity.
  • Stress-strain behavior: The stress-strain behavior (depending on the material) is measured according to common standards, such as DIN EN ISO 527-3, on both treated and untreated samples.

 

to top

Consulting and Training on Trace Analysis

Training trace analysis
© Fraunhofer CSP
Book an on-site training under the professional guidance of our staff.

We offer comprehensive consulting services for inorganic trace element analysis, both on surfaces and within materials.

Our expertise includes on-site training for your employees to ensure that you apply best practices in sensitive trace analysis.

We are also happy to assist you in setting up your own trace analysis laboratory.

 

 

 

to top