High Purity Oligosilanes

© Fraunhofer CSP
Molecular structure of hexachlorodisilane (HCDS).

New technology generations in microelectronics require innovative precursors for the deposition of silicon nitride and silicon oxynitride layers at very low temperatures. They are used instead of monomer precursors where particularly low temperatures are required for CVD deposition processes. At the same time, the requirements for purity are increasing, especially with regard to metallic impurities that could produce damage in active regions of the circuit structure through diffusion. With detection limits of (for most elements) well below 1 pbb, sensitive and reliable purity analyses of oligosilanes can be performed at the Fraunhofer CSP.

In the project "SilaTrace" we develop together with our partner PSC Polysilane Chemistry GmbH high purity pentachlordisilane as an attractive product for the microelectronics industry. At Fraunhofer CSP, the main focus is on the optimization of trace analysis to ensure product quality. This funding is financed by the European Regional Development Fund (ERDF).